Russian Federation

Совместные статьи (5)

1. Sensitivity and Contrast Characterization of PMMA 950K Resist Under 30 keV Focused Ga+ Ion Beam Exposure

   Micromachines · 2025 · Q1 · ❝ 2

   Mukhit Muratov, Yana Shabelnikova, Sergey Zaitsev, Renata Nemkayeva, Nazim Guseinov

   Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences Mukhit Muratov Yana Shabelnikova Sergey Zaitsev

2. DETERMINATION OF RESIST CONTRAST IN ELECTRON BEAM LITHOGRAPHY UNDER DEPTH-DEPENDENT NONUNIFORM ENERGY DEPOSITION

   Herald of the Kazakh-British Technical University · 2025 · Q4

   M. M. Muratov, S. I. Zaitsev, M. I. Pshikov, N. R. Guseinov, R. R. Nemkayeva, Ye. S. Mukhametkarimov, Zh. K. Tolepov, D. S. Akhmetsadyk

   Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences M. M. Muratov S. I. Zaitsev M. I. Pshikov Ye. S. Mukhametkarimov Zh. K. Tolepov D. S. Akhmetsadyk

3. Comprehensive Investigation of the Commercial ELP-20 Electron-Beam Lithography Resist

   Micromachines · 2025 · Q1

   Meruert Qairat, Aliya Alzhanova, Mustakhim Pshikov, Renata Nemkayeva, Nazim Guseinov, Sergey Zaitsev, Mukhit Muratov

   Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences Meruert Qairat Aliya Alzhanova Mustakhim Pshikov Sergey Zaitsev Mukhit Muratov

4. Experimental investigation of the distribution of energy deposited by FIB in ion-beam lithography

   Journal of Nano and Electronic Physics · 2020 · Q3 · ❝ 1

   National Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty, Kazakhstan, M. Muratov, M. Myrzabekova, National Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty, Kazakhstan, N. Guseinov, National Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty, Kazakhstan, R. Nemkayeva, National Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty, Kazakhstan, D. Ismailov, National Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty, Kazakhstan, Ya. Shabelnikova, Institute of Microelectronics Technology and High-Purity Materials RAS, Chernogolovka, Russia, S. Zaitsev, Institute of Microelectronics Technology and High-Purity Materials RAS, Chernogolovka, Russia

   Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences National Nanotechnological Laboratory of Open Type Al-Farabi Kazakh National University Almaty Kazakhstan M. Muratov National Nanotechnological Laboratory of Open Type Al-Farabi Kazakh National University Almaty Kazakhstan National Nanotechnological Laboratory of Open Type Al-Farabi Kazakh National University Almaty Kazakhstan National Nanotechnological Laboratory of Open Type Al-Farabi Kazakh National University Almaty Kazakhstan National Nanotechnological Laboratory of Open Type Al-Farabi Kazakh National University Almaty Kazakhstan Ya. Shabelnikova Institute of Microelectronics Technology and High-Purity Materials RAS Chernogolovka Russia S. Zaitsev Institute of Microelectronics Technology and High-Purity Materials RAS Chernogolovka Russia

5. Organic Resist Contrast Determination in Ion Beam Lithography

   Semiconductors · 2020 · Q4 · ❝ 1

   Ya. L. Shabelnikova, S. I. Zaitsev, N. Gusseinov, M. Gabdullin, M. M. Muratov

   Russian Academy of Sciences Ya. L. Shabelnikova S. I. Zaitsev M. M. Muratov